Related substances (GC) (Benzaldehyde (Impurity A))
≤ 0.15 %
Related substances (GC) (Cyclohexylmethanol (Impurity B))
≤ 0.10 %
Related substances (GC) (Sum of peaks with a relative retention less than that of benzyl alcohol)
≤ 0.04 %
Related substances (GC) (Sum of peaks with a relative retention greater than that of benzyl alcohol)
≤ 0.3 %
Related substances (GC) (disregard limit)
≤ 0.0001 %
Benzene (GC)
≤ 0.0002 %
Chlorobenzene (GC)
≤ 0.01 %
Toluene (GC)
≤ 0.01 %
Other residual solvents (ICH Q3C)
excluded by manufacturing process
Evaporation residue
≤ 0.050 %
Water
≤ 0.10 %
Elemental impurity specifications have been set considering ICH Q3D (Guideline for Elemental Impurities).
Class 1-3 elements are not likely to be present above the ICH Q3D option 1 limit, unless specified and indicated (*).
Conforms to Ph Eur, BP, JP, NF